Dielectric constant measurement sensitivity in electrostatic force and force gradient microscopy-based modes

Understanding the nanoscale electrostatic interaction between a conductive atomic force microscopy (AFM) probe and dielectric film is central to operation of various microscopies determination properties film. There no simple analytical description generated in confined probe-sample geometry for neither static nor dynamic AFM modes used measurements. An accurate involved physics obtained only by means finite element analysis modeling system. However, alternative using numerical not very popular due being slower requiring relatively high computation resources. In this work, we revised contributions from different parts capacitance both methods. We tried reconciliate two approaches observed differences as function material parameters. Under noise levels, efficiency an model was tested against that captures detail AFM-based The investigation performed spectroscopic force-distance curves constant height scans with measurements deflection frequency probe. measurement sensitivities are relevant selecting optimal scanning mode its operational parameters given thicknesses constants but also show critical role correct interpretation